kw.\*:("Ion plasma")
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New microwave ion source for multiply charged ion beam productionTOKIGUCHI, K; AMEMIYA, K; KOIKE, H et al.Vacuum. 1988, Vol 38, Num 6, pp 487-490, issn 0042-207XArticle
Effect of a magnetic field on ion extraction in a grid-stabilized sourceNIKOLAEV, A. G; OKS, E. M; SHCHANIN, P. M et al.Soviet physics. Technical physics. 1992, Vol 37, Num 6, pp 738-740, issn 0038-5662Article
Technological sources of charged particles with plasma emittersBUGAEV, S. P.IEEE transactions on plasma science. 1991, Vol 19, Num 5, pp 743-745, issn 0093-3813Article
Negative-ion plasma sourcesSHEEHAN, D. P; RYNN, N.Review of scientific instruments. 1988, Vol 59, Num 8, pp 1369-1375, issn 0034-6748, part 1Article
Measurements on a dc volume H- multicusp ion source for TRIUMFKENDALL, K. R; MCDONALD, M; MOSSCROP, D. R et al.Review of scientific instruments. 1986, Vol 57, Num 7, pp 1277-1281, issn 0034-6748Article
Conformal ion implantationADLER, R. J; ABERCROMBIE, J.Surface & coatings technology. 2002, Vol 156, Num 1-3, pp 258-261, issn 0257-8972Conference Paper
Beam emittance growth caused by a nonuniform ion densityHOLMES, A. J. T; SURREY, E.Review of scientific instruments. 1991, Vol 62, Num 5, pp 1173-1178, issn 0034-6748, 6 p.Article
Etude de faisabilité de faisceaux d'ions de dimensions microniques à partir d'une source à plasma = Feasibility study of ion beams of micronic size from a plasma sourceBENIN, Patrick.1984, 124 p.Report
Characteristics of a gas-filled diode with a plasma ion emitterBOLDASOV, V. S; KUZ'MICHEV, A. I; SHABAROV, A. YU et al.High temperature. 1991, Vol 29, Num 3, pp 324-328, issn 0018-151XArticle
Dust streaming effect on dust acoustic solitary wave in magnetized dust-ion plasmasMAHMOOD, S; MUSHTAQ, A.Journal of fusion energy. 2002, Vol 21, Num 3-4, pp 199-203, issn 0164-0313, 5 p.Article
Réflexion Compton inverse pour un plasma non relativiste ioniséKER'NER, S. R; SHIKHOVTSEVA, E. S.Astrofizika. 1983, Vol 19, Num 4, pp 803-814, issn 0571-7132Article
Cathodic arc sources and macroparticle filteringKARPOV, D. A.Surface & coatings technology. 1997, Vol 96, Num 1, pp 22-33, issn 0257-8972Conference Paper
Beam-plasma type metal ion sourceISHIKAWA, J; TAKAGI, T.Japanese journal of applied physics. 1983, Vol 22, Num 3, pp 534-540, issn 0021-4922Article
Partial redistribution in high-density, highly ionized plasmasTALIN, B; STAMM, R; KAFTANDJIAN, V. P et al.The Astrophysical journal. 1987, Vol 322, Num 2, pp 804-811, issn 0004-637X, 1Article
Weak compressive ion acoustic double layers in presence of negative ions on the auroral field linesGOSWAMI, K. S; BUJARBARUA, S.Journal of the Physical Society of Japan. 1987, Vol 56, Num 7, pp 2396-2400, issn 0031-9015Article
Rayonnement d'équilibre d'un plasma optiquement épais de faible densitéKEL'NER, S. R; SHIKHOVTSEVA, E. S.Pis'ma v astronomičeskij žurnal. 1984, Vol 10, Num 1, pp 76-80Article
Second-order pair-correlation function for multicomponent plasmasKALMAN, G.Physical review. A, General physics. 1984, Vol 30, Num 1, pp 627-629, issn 0556-2791Article
In situ process monitoring in plasma immersion ion implantation based on measurements of secondary electron emission coefficientNAKAMURA, Keiji; TANAKA, Mitsuaki; SUGAI, Hideo et al.Surface & coatings technology. 2002, Vol 156, Num 1-3, pp 83-86, issn 0257-8972Conference Paper
Development of high-density RF plasma and application to PVDMIYAKE, S; SETSUHARA, Y; SAKAWA, Y et al.Surface & coatings technology. 2000, Vol 131, Num 1-3, pp 171-176, issn 0257-8972Conference Paper
Recent advance in surface treatment and its applications in ChinaLIU XIANGHUAI.Surface & coatings technology. 2000, Vol 131, Num 1-3, pp 261-266, issn 0257-8972Conference Paper
Process control of a plasma treatment of wool by plasma diagnosticsOSENBERG, F; THEIRICH, D; DECKER, A et al.Surface & coatings technology. 1999, Vol 116-19, pp 808-811, issn 0257-8972Conference Paper
Direct power coupling into a waveguide cavity plasma sourceMÜLLER, A; EMME, M; KORZEC, D et al.Surface & coatings technology. 1999, Vol 116-19, pp 674-678, issn 0257-8972Conference Paper
A 13.56 MHz multicusp ion source for gaseous ion-beam productionBOONYAWAN, D; SUANPOOT, P; VILAITHONG, T et al.Surface & coatings technology. 1999, Vol 112, Num 1-3, pp 314-317, issn 0257-8972Conference Paper
Commercial plasma source ion implantation facilitySCHEUER, J. T; WALTER, K. C; ADLER, R. A et al.Surface & coatings technology. 1997, Vol 93, Num 2-3, pp 192-196, issn 0257-8972Conference Paper
Negative ion beams from a plasma type source with additional surface ionizationLATUSZYNSKI, A; KORNARZYNSKI, K; DROZDZIEL, A et al.Vacuum. 1996, Vol 47, Num 10, pp 1219-1222, issn 0042-207XArticle